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  • Common vacuum leak detection methods

    Common vacuum leak detection methods

    Vacuum Mud Sealing Detection Method Vacuum mud will be sealed one by one suspicious leak point, pay attention to the change of vacuum degree. If the vacuum degreeHard film vacuum coating machine Suppliers of pasted vacuum mud increases rapidly, removal has a significant decline, indicating that this is a leak point. This method is seldom used in practical application. read more

    05 Sep,2019 Industry News
  • Common vacuum leak detection methods

    Common vacuum leak detection methods

    Leak detection by helium mass spectrometry This technology is an indispensable technology in the field of vacuum leak detection. It is widely used in leak detection because of its high leak detection efficiency, easy operation, sensitive instrument response, high precision and not China PVD Coating Systems supplierseasily interfered by other gases. Helium mass spectrometer leak detector is a kind of gas tightness detection instrument based on mass spectrometry principle, which uses helium as lea... read more

    30 Aug,2019 Industry News
  • Common methods of PVD Technology

    Common methods of PVD Technology

    Common methods of PVD Technology Arc ion plating The cathodic arc technology is used to deposit thin film materials by ionizing the target material into ionic state under vacuum conditions with low voltage and high current. The material has higher ionization rate and better film performance.China Plasma Coating Machine suppliers read more

    23 Aug,2019 Industry News
  • Common methods of PVD Technology

    Common methods of PVD Technology

    Common methods of PVD Technology RF (radio frequency) sputtering The frequency of RF sputtering is about 13.56 MHz. It does not need hot cathode and can sputter at lower pressure and voltage. RF sputtering can depositChina PVD Coating Systems suppliers not only metal films, but also insulating dielectric films of various materials, so it has a wide range of applications. read more

    16 Aug,2019 Industry News
  • Common methods of PVD Technology

    Common methods of PVD Technology

    Sputtering deposition Sputtering is a thin film deposition technique associated with gas glow discharge. There are many sputtering methods, such as direct current sputtering, RF sputtering and reactive sputtering. Magnetron sputtering, intermediate frequencyChina PVD Coating Systems suppliers sputtering, direct current sputtering, RF sputtering and ion beam sputtering are widely used. Characteristic: The inert gas (such as argon) needed for discharge is filled in vacuum chamber. Under the action... read more

    10 Aug,2019 Industry News

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