Vacuum evaporation coating is a kind of technology to obtain thin film by evaporating some substance on the surface of substrate material by heating evaporation source under vacuum condition. The material evaporated is called evaporation material. Vacuum evaporation coating PVD Plating Machine Supplierssystem is generally composed of three parts: vacuum chamber, evaporation source or evaporation heating device, placing substrate and heating device for substrate. In order to evaporate the materia... read more
First of all, the arc striking needle (anode) with positive potential is close to the target (cathode) with negative potential. When the distance between the anode and cathode is small enough, the gas between the two electrodes will be broken down, forming an arc current, which is similar to the arc striking of electric welding. At this time, part of N2 is ionized to form nitrogen cations and electrons. Attracted by the electric field force, the nitrogen cation will fly to the cathode near the t... read more
Sputtered target material has the characteristics of high purity, high density, multi-component and uniform grain, which is generally composed of target blank and back plate. The target blank belongs to the core part of sputtering target material and is the target material bombarded by high-speed ion beam. After the target is impacted by ions, the atoms on the surface of the target are sputtered out and deposited on the substrate to form an electronic thin film. Due to the low strength of high p... read more
PVD(Physical Vapor Deposition technology is one of the main technologies for the preparation of thin film materials. Under vacuum conditions, a material is vaporized into gaseous atoms, molecules or partial ionization into ions, and then deposited on the surface of substrate materials by low pressure gas (or plasma) process, which has the characteristics of antireflection, reflection, protective conductivity, magnetic conductivity, insulation, corrosion resistance, oxidation resistance, radiatio... read more
Ion plating is a method of partially ionizing the gas or evaporated material by gas discharge under vacuum condition, and depositing the evaporated material or its reactant on the substrate under the bombardment of gas ions or evaporated substance ions. These include magnetron sputtering ion plating, reactive ion plating, hollow cathode discharge ion plating (hollow cathode evaporation), multi arc ion plating (cathodic arc ion plating), etc. In ion plating, the evaporated material ... read more
No. 79 West Jinniu Road,
Yuyao,
Ningbo City, Zhejiang Provice, China
+86-15867869979