Water cooled DC power supply with compact structure can achieve the best coating quality, so it can replace the pulse power supply in magnetron sputtering process.
• The system greatly shortens the reaction time, and the residual arc energy reduced to a minimum rate
• Even in the high arc rate of the process, it can ensure that the film is thin and homogeneous.
• Extremely low arc remnant energy, fast recovery
• Advanced DC sputtering applications
• To achieve high power output in a compact structure
• Water cooled power supply
• Significantly improve production efficiency
• High performance film quality
• Even greater than 40 KW power supply, and system integration also very convenient
• High system stability and low maintenance cost
No. 81 West Jinniu Road,
Ningbo City, Zhejiang Provice, China