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Common methods of PVD Technology RF (radio frequency) sputtering The frequency of RF sputtering is about 13.56 MHz. It does not need hot cathode and can sputter at lower pressure and voltage. RF sputtering can depositChina PVD Coating Systems suppliers not only metal films, but also insulating dielectric films of various materials, so it has a wide range of applications. read more
Sputtering deposition Sputtering is a thin film deposition technique associated with gas glow discharge. There are many sputtering methods, such as direct current sputtering, RF sputtering and reactive sputtering. Magnetron sputtering, intermediate frequencyChina PVD Coating Systems suppliers sputtering, direct current sputtering, RF sputtering and ion beam sputtering are widely used. Characteristic: The inert gas (such as argon) needed for discharge is filled in vacuum chamber. Under the action... read more
After months of hard work, our Indian agent will welcome two Danco vacuum coating machines(panda machines). They will begin service in August.Plasma Coating Machine suppliers From July 25th to August 4th, Sara and engineer will install equipment and train Indian employees. In the meantime, if a client wants to visit us, he can see our work at close range without having to go to China. If you want to visit us, please contact Sara: +86 15867869979 read more
20 JULY,2019-- 22 JULY,2019 WELCOME TO VISIT US: A02 CONTACT: SARA 00919307690817 read more
Firstly, the uniformity and direction of magnetic field should be ensured to form a relatively uniform space magnetic field. Secondly, the uniformity of air pressure should be ensured as far as possible. When designing the vacuum chamber, the installation position of the vacuum pump, the wayEvaporation Vacuum Coating Machine Factory of the process gas intake and the layout of the process pipe in the chamber should be considered. Thirdly, because the magnetic field and air pressure ... read more
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